With increasing thickness of the Ag surface layer, the average tr

With increasing thickness of the Ag surface layer, the average transmittance of the multilayer films first increases then decreases. Compared with the bare ITO films, the absorption of multilayer films increases due to the introduction of a double Ag layer. However, the absorption of Ag1/ITO/Ag film is close to that of the bare ITO film, selleck chemicals llc and no absorption peaks appeared.

Figure 7 Optical absorption spectra of the ITO and Ag/ITO/Ag multilayer films. Conclusions Ag/ITO/Ag multilayer films with different thicknesses of the surface Ag layer were prepared by magnetron sputtering on a glass substrate. Microstructural LY2874455 nmr analysis shows that the multilayer films have a polycrystalline structure. As the thickness of the Ag surface layer increases, the preferred orientation of Ag (111) intensified. With increasing thickness of Ag surface layer, the transmittance spectra and reflectance spectra of Ag/ITO/Ag multilayer films decrease and increase, respectively. Ag3/ITO/Ag multilayer

film shows the best comprehensive property and can be used as a potential transflective candidate in future LCD. Acknowledgements This work is supported by the National Natural Science Foundation of China (nos. 51072001 and 51272001), National Key Basic Research Program GDC-0941 cost (973 Project) (2013CB632705), and the National Science Research Foundation for Scholars Return from Overseas, Ministry of Education, China. The authors would like to thank Yonglong Zhuang and Zhongqing Lin of the Experimental Technology Center of Anhui University for the electron microscope test and discussion. References 1. Bhatti MT, Rana AM, Khan AF: Characterization of rf-sputtered indium tin oxide thin films. Mater Chem Phys Inositol oxygenase 2004, 84:126.CrossRef 2. Dawar AL, Joshi JC:

Semiconducting transparent thin films: their properties and applications. J Mater Sci-Mater M 1984, 19:1.CrossRef 3. Meng LJ, Placido F: Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecommunication applications. Surf Coat Tech 2003, 166:44.CrossRef 4. Deng W, Ohgi T, Nejo H: Development of conductive transparent indium tin oxide (ITO) thin films deposited by direct current (DC) magnetron sputtering for photon-STM applications. Appl Phys A-Mater 2001, 72:595.CrossRef 5. Chopra KL, Major S, Pandya DK: Transparent conductors-A status review. Thin Solid Films 1983, 102:1.CrossRef 6. Cui HN, Xi SQ: The fabrication of dipped CdS and sputtered ITO thin films for photovoltaic solar cells. Thin Solid Films 1996, 288:325.CrossRef 7. Miedziński R, Ebothé J, Kozlowski G, Kasperczyk J, Kityk IV: Laser induced microrelief superstructure of Ag/ITO seed-mediated nanocomposites. Superlattice Microst 2009, 46:637.CrossRef 8. Choi KH, Kim JY, Lee YS, Kim HJ: ITO/Ag/ITO multilayer films for the application of a very low resistance transparent electrode. Thin Solid Films 1999, 341:152.CrossRef 9.

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